This new model is for slicing large size CVD / SiC wafers, which solve the problem of materials loss, thermal and stress damage during processing with old methods and achieve zero edge chipping.
This new model is for slicing large size CVD / SiC wafers efficiently, which solve the problem of materials loss, thermal and stress damage during processing with old methods and achieve zero edge chipping.
It provide preparation capabilities of core material such as diamond substrates for next-generation high-frequency and high-power electronic devices, NV centers chips for quantum sensing, and heat sinks for high-power lasers.